Advances in optical and electron microscopy by Tom Mulvey, Charles J.R. Sheppard

By Tom Mulvey, Charles J.R. Sheppard

The volumes during this sequence conceal the development and innovation in optical and electron microscopy at a basic point. it's aimed toward microscopists and researchers not just drawn to microscope instrumentation but additionally in functions starting from organic innovations to fabrics examine and commercial inspection

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As shown schematically in Fig. 15, this disturbance of the image wave depends on the distance from the shadow of the filament. The disturbance becomes weaker as the axial distance of the biprism from the image plane becomes smaller and it disappears when the biprism is positioned exactly in the image plane. However, then there is in principle no overlapping of the two waves in the image plane. Following a proposal of Wahl (1975), the hologram could be recorded below the image plane, but this in turn increases the coherence requirements and in turn leads to a loss of spatial frequencies.

The essence of holography in the electron microscope lies in the fact that the electron image wave is recorded completely in a single hologram and is reconstructed as a non-electron copy wave allowing one to perform waveoptical procedures more easily than in the electron microscope itself. Up to now, the electron wave has usually been reconstructed as a light optical wave. More recently, however, numerical reconstruction of the image has ELECTRON IMAGE PLANE OFF-AXIS HOLOGRAPHY 37 been successfully carried out by the author and his colleagues at the University of Tübingen.

H. LICHTE 54 back focal reference wave plane image wave **R hologram image plane FIG. 16 Loss of high spatial frequency components, if the hologram is taken at a distance D from the image plane: In a strip of width w, spatial frequencies higher than Rw do not contribute to the recorded wave and subsequently cannot be reconstructed. F. Problems of recording an electron hologram The characteristics of photographic emulsions under electron exposure have been thoroughly investigated by Frieser and Klein (1958) and Frieser et al.

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